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1

Mask replication using jet and flash imprint lithography

Selinidis, Kosta S.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2011

Language:

english

File:

PDF, 2.48 MB

english, 2011

2

Nanoscale Magnification and Shape Control System for Precision Overlay in Jet and Flash Imprint Lithography

Cherala, Anshuman, Schumaker, Philip, Mokaberi, Babak, Selinidis, Kosta, Choi, Byung Jin, Meissl, Mario J., Khusnatdinov, Niyaz N., LaBrake, Dwayne, Sreenivasan, S. V.

Journal:

IEEE/ASME Transactions on Mechatronics

Year:

2015

Language:

english

File:

PDF, 1.13 MB

english, 2015

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Inspection of imprint lithography patterns for semiconductor and patterned media

Resnick, Douglas J., Herr, Daniel J. C., Haase, Gaddi, Singh, Lovejeet, Curran, David, Schmid, Gerard M., Luo, Kang, Brooks, Cindy, Selinidis, Kosta, Fretwell, John, Sreenivasan, S. V.

Year:

2010

Language:

english

File:

PDF, 5.88 MB

english, 2010

4

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Inspection and repair for imprint lithography at 32 nm and below

Selinidis, Kosta, Hosono, Kunihiro, Thompson, Ecron, Sreenivasan, S. V., Resnick, Douglas J., Pritschow, Marcus, Butschke, Joerg, Irmscher, Mathias, Sailer, Holger, Dobberstein, Harald

Year:

2009

Language:

english

File:

PDF, 5.19 MB

english, 2009

5

Patterned wafer defect density analysis of step and flash imprint lithography

I. Mcmackin, W. Martin, J. Perez, K. Selinidis, J. Maltabes, F. Xu, D. Resnick, S. V. Sreenivasan

Year:

2008

Language:

english

File:

PDF, 838 KB

english, 2008

6

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Electron beam inspection methods for imprint lithography at 32 nm

Selinidis, Kosta, Behringer, Uwe F. W., Thompson, Ecron, Sreenivasan, S. V., Resnick, Douglas J.

Year:

2009

Language:

english

File:

PDF, 1.62 MB

english, 2009

7

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Evaluation of e-beam repair for nanoimprint templates

Pritschow, Marcus, Kawahira, Hiroichi, Zurbrick, Larry S., Boegli, Volker, Butschke, Joerg, Irmscher, Mathias, Resnick, Douglas, Sailer, Holger, Selinidis, Kosta, Thompson, Ecron

Year:

2008

Language:

english

File:

PDF, 10.27 MB

english, 2008

8

[IEEE 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings - Cambridge, MA, USA (10-12 Sept. 1997)] 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings - Stepper registration analysis using Monte Carlo modeling

Waldo, W.G., Selinidis, K., Espenscheid, A.

Year:

1997

Language:

english

File:

PDF, 307 KB

english, 1997

9

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Increasing effective resolution through surface conditioners for 1x imprint templates, and photo mask applications beyond 65nm

Selinidis, Kosta S., Lercel, Michael J., Maltabes, John G., Rao, Madhukar B., Zhang, Peng

Year:

2006

Language:

english

File:

PDF, 1.20 MB

english, 2006

10

[IEEE 2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks - Aventura, FL, USA (24-28 July 2000)] 2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) - Nonlinear optics and spectroscopic ellipsometry as complementary sensors to monitor and control SiGe growth

Montese, L., Wilson, P.T., Selinidis, K., Lim, D., Jiang, Y., Canterbury, J.D., Ekerdt, J.G., Downer, M.C.

Year:

2000

Language:

english

File:

PDF, 145 KB

english, 2000

11

Full field imprint masks using variable shape beam pattern generators

K. Selinidis, E. Thompson, G. Schmid, N. Stacey, J. Perez, J. Maltabes, S. V. Sreenivasan, D. J. Resnick, A. Fujii, Y. Sakai, S. Sasaki, N. Hayashi

Year:

2008

Language:

english

File:

PDF, 2.53 MB

english, 2008

12

Integration Challenges of Inorganic Low-K (K≤2.5) Materials with CU for Sub-0.25μm Multilevel Interconnects

Yu, K. C., Defilippi, J., Tiwari, R., Sparks, T., Smith, D., Olivares, M., Selinidis, S., Zhang, J., Junker, K., Braekelmann, G., Farkas, J., Lee, K. S., Filipiak, S., Lindell, M., Watanabe, J. K., We

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 3.39 MB

english, 1999

13

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - A study of imprint-specific defects in the step and flash imprint lithography process

Perez, J., Lercel, Michael J., Selinidis, K., Johnson, S., Fletcher, B., Xu, F., Maltabes, J., McMackin, I., Resnick, D., Sreenivasan, S. V.

Year:

2007

Language:

english

File:

PDF, 603 KB

english, 2007

14

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - 32 nm imprint masks using variable shape beam pattern generators

Selinidis, Kosta, Horiuchi, Toshiyuki, Thompson, Ecron, Schmid, Gerard, Stacey, Nick, Perez, Joseph, Maltabes, John, Resnick, Douglas J., Yeo, Jeongho, Kim, Hoyeon, Eynon, Ben

Year:

2008

Language:

english

File:

PDF, 2.81 MB

english, 2008

15

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Development of template and mask replication using jet and flash imprint lithography

Brooks, Cynthia, Selinidis, Kosta, Doyle, Gary, Brown, Laura, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V., Montgomery, M. Warren, Maurer, Wilhelm

Year:

2010

Language:

english

File:

PDF, 11.14 MB

english, 2010

16

Integration Challenges of Inorganic Low-K (K≤2.5) Materials with Cu for Sub-0.25µm Multilevel Interconnects

Yu, K. C., Defilippi, J., Tiwari, R., Sparks, T., Smith, D., Olivares, M., Selinidis, S., Zhang, J., Junker, K., Braekelmann, G., Farkas, J., Lee, K. S., Filipiak, S., Lindell, M., Watanabe, J. K., We

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 3.41 MB

english, 1999

17

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Defect inspection of imprinted 32 nm half pitch patterns

Selinidis, Kosta, Kawahira, Hiroichi, Zurbrick, Larry S., Thompson, Ecron, McMackin, Ian, Perez, Joseph, Sreenivasan, S. V., Resnick, Douglas J.

Year:

2008

Language:

english

File:

PDF, 2.71 MB

english, 2008

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Automated imprint mask cleaning for step-and-flash imprint lithography

Singh, Sherjang, Chen, Ssuwei, Selinidis, Kosta, Fletcher, Brian, McMackin, Ian, Thompson, Ecron, Resnick, Douglas J., Dress, Peter, Dietze, Uwe, Schellenberg, Frank M., La Fontaine, Bruno M.

Year:

2009

Language:

english

File:

PDF, 825 KB

english, 2009

19

Process Control Challenges and Solutions: TEOS, W, and CU CMP

Mendonca, J., Dang, C., Selinidis, S., Angyal, M., Boeck, B., Islam, R., Pettinato, C., Grudowski, P., Cope, J., Smith, B., Kolagunta, V.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 1.48 MB

english, 1999

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Progress in mask replication using jet and flash imprint lithography

Selinidis, Kosta S., Herr, Daniel J. C., Brooks, Cynthia B., Doyle, Gary F., Brown, Laura, Jones, Chris, Imhof, Joseph, LaBrake, Dwayne L., Resnick, Douglas J., Sreenivasan, S.V.

Year:

2011

Language:

english

File:

PDF, 8.07 MB

english, 2011

21

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - High-resolution e-beam repair for nanoimprint templates

Pritschow, Marcus, Zurbrick, Larry S., Montgomery, M. Warren, Dobberstein, Harald, Edinger, Klaus, Irmscher, Mathias, Resnick, Douglas J., Selinidis, Kosta, Thompson, Ecron, Waiblinger, Markus

Year:

2009

Language:

english

File:

PDF, 1006 KB

english, 2009

22

Process control for 32 nm imprint masks using variable shape beam pattern generators

Ecron Thompson, Kosta Selinidis, John G. Maltabes, Douglas J. Resnick, S.V. Sreenivasan

Journal:

Microelectronic Engineering

Year:

2009

Language:

english

File:

PDF, 743 KB

english, 2009

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning

Selinidis, Kosta, Schellenberg, Frank M., La Fontaine, Bruno M., Thompson, Ecron, McMackin, Ian, Sreenivasan, S.V., Resnick, Douglas J.

Year:

2009

Language:

english

File:

PDF, 5.12 MB

english, 2009

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning

McMackin, I., Schellenberg, Frank M., Perez, J., Selinidis, K., Maltabes, J., Resnick, D., Sreenivassan, S. V.

Year:

2008

Language:

english

File:

PDF, 2.00 MB

english, 2008

25

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Mask replication using jet and flash imprint lithography

Selinidis, Kosta S., Maurer, Wilhelm, Abboud, Frank E., Jones, Chris, Doyle, Gary F., Brown, Laura, Imhof, Joseph, LaBrake, Dwayne L., Resnick, Douglas J., Sreenivasan, S. V.

Year:

2011

Language:

english

File:

PDF, 6.16 MB

english, 2011

26

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Inspection of 32nm imprinted patterns with an advanced e-beam inspection system

Xiao, Hong, Zurbrick, Larry S., Montgomery, M. Warren, Ma, Long, Wang, Fei, Zhao, Yan, Jau, Jack, Selinidis, Kosta, Thompson, Ecron, Sreenivasan, S. V., Resnick, Douglas J.

Year:

2009

Language:

english

File:

PDF, 2.45 MB

english, 2009

27

In situ control and monitoring of doped and compositionally graded SiGe films using spectroscopic ellipsometry and second harmonic generation

L Mantese, K Selinidis, P.T Wilson, D Lim, Y.Y Jiang, J.G Ekerdt, M.C Downer

Journal:

Applied Surface Science

Year:

2000

Language:

english

File:

PDF, 294 KB

english, 2000

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